Simulation for Wet Bench Technology

Country:
Germany

Client:
SEZ Group

Background:
SEZ is a leading supplier of wet wafer surface preparation equipment to the semiconductor industry. It also manufactures and sells products for batch processing, including etching and cleaning. CTR has supported the development of wet bench tools by optimising diffusers using CFD modelling. Experiments have verified the success of the simulation. 

CTR services:
CFD simulation of the wet bench process and optimisation of the complex diffuser geometry; visualisation of flow fields with coloured liquids in transparent tanks

Project duration:
7 Months

Project Scope:
Interpretation of the simulation and visualisation results by experts in the field of fluid dynamics. Analysis for optimising the diffuser geometries, which have substantially improved the homogeneousness of the flow, and thus the etch rate on the wafer.